Versatile gas analyser provides cost-effective, reliable and precise measurements for vast array of industrial applications

ENVEA’s LAS 5000XD in-situ laser (TDLS) gas analyser has been developed to meet the needs of a wide variety of emissions monitoring and process applications where certification is not a necessity.

The versatile LAS 5000XD gas analyser is ideal for ammonia slip control (DeNOx), process and combustion control, HF emission control in aluminium plants, HCl/SO2 abatement control, ethylene cracking furnace control, HCl levels in semiconductor production and ammonia concentration control in pet food, fertiliser plants, among a host of applications.

This analyser comes in a variety of models for measuring many different parameters such as NH3 + H2O, HF, CO + CO2, O2, HCl + H2O, CO2 + H2O, etc., providing a large and dynamic measurement range from ppm to %. To give just a few specific examples of LAS 5000XD’s capabilities, the device measures NH3 + H2O 0–10 ppm / 0–5000 ppm + 0–5 % / 0–40%, HF 0–3 ppm / 0–500 ppm and CO + H2O 0-50 ppm / 0-1% + 0-5% / 0-40% among many others.

With no gas conditioning necessary, there is no calibration required, as well as no measurement drift. The laser-based technology is less prone to problems caused by temperature influences and cross-interferences and is relatively maintenance-free. This analyser has been designed to offer robustness, a fast response time (1 second) and highly accurate measurements in harsh environments (ready for Ex Zone II), whilst having very limited maintenance requirements and therefore very low running costs. In addition, the raw gas measurement is paired with a flow measurement device to control and optimise absorbent use.

LAS 5000 XD offers real-time communication between receiver and transmitter units so the user has rapid access to data and an embedded web server – so dedicated software is not required. In addition, the LAS 5000 XD includes a specific feature, named ‘ClearPath’, for managing outside path interference. Thanks to ClearPath, interference caused by relative humidity is under control as O2 or CO2 is removed from the purging areas. This feature ensures extremely precise measurements of H2O, O2 and CO2. Consequently, N2 and dry air purge are not needed.

An extensive package of optional accessories, such as a thermal shield and weather-protection covers, are available to ensure efficient and trouble-free operation.